Characterization, Integration and Reliability of HfO 2 and LaLuO 3 High-kappa-metal Gate Stacks for CMOS Applications
| Author | : Alexander Nichau |
| Publisher | : |
| Total Pages | : 0 |
| Release | : 2013 |
| ISBN-10 | : OCLC:1073563212 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Characterization, Integration and Reliability of HfO 2 and LaLuO 3 High-kappa-metal Gate Stacks for CMOS Applications by : Alexander Nichau
Download or read book Characterization, Integration and Reliability of HfO 2 and LaLuO 3 High-kappa-metal Gate Stacks for CMOS Applications written by Alexander Nichau and published by . This book was released on 2013 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: