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Microstructure and diffusion behavior in polycrystalline silicon
Language: en
Pages: 234

Microstructure and diffusion behavior in polycrystalline silicon

Authors: Keun Hyung Park
Categories: Polycrystalline semiconductors
Type: BOOK - Published: 1991 - Publisher:

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Boron Activation and Diffusion in Polycrystalline Silicon with Flash-assist Rapid Thermal Annealing
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Boron Activation and Diffusion in Polycrystalline Silicon with Flash-assist Rapid Thermal Annealing

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ABSTRACT: The rigorous scaling in dimensions for future generations of transistor fabrication demands ever steeper requirements for dopant solubility with minim
The impact of interfacial oxide on microstructure and diffusion in polysilicon-on-silicon
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The impact of interfacial oxide on microstructure and diffusion in polysilicon-on-silicon

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Polycrystalline Silicon for Integrated Circuit Applications
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Polycrystalline Silicon for Integrated Circuit Applications

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Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life,
Polysilicon Thin Films and Interfaces: Volume 182
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Polysilicon Thin Films and Interfaces: Volume 182

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.