Related Books
Language: en
Pages: 650
Pages: 650
Type: BOOK - Published: 2021-09-10 - Publisher: Woodhead Publishing
Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, hi
Language: en
Pages: 538
Pages: 538
Type: BOOK - Published: 2016-01-09 - Publisher: Woodhead Publishing
Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semicon
Language: en
Pages: 330
Pages: 330
Type: BOOK - Published: 2011-12-06 - Publisher: William Andrew
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing
Language: en
Pages: 444
Pages: 444
Type: BOOK - Published: 2004-01-26 - Publisher: Springer Science & Business Media
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor te
Language: en
Pages: 191
Pages: 191
Type: BOOK - Published: 2018-07-03 - Publisher: MDPI
This book is a printed edition of the Special Issue "Micro/Nano Manufacturing" that was published in Micromachines